The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 1995
Filed:
Jul. 19, 1993
Damon F Kvamme, Ann Arbor, MI (US);
Richard C Kim, Ann Arbor, MI (US);
General Scientific Corporation, Ann Arbor, MI (US);
Abstract
A telemicroscopic lens configuration for high quality optical imaging applications which provides high magnification of a work area with a wide field of view. The telemicroscopic lens configuration is a Galilean-type configuration having a positive-power objective lens and a negative-power eyepiece lens separated by an air space. The focal length of the objective lens and the air space distance are optimized to provide the magnification and overall effective focal length of the instrument. The focal length of the eyepiece lens is chosen so that the object being magnified appears in front of the viewer. Different lens materials are selected to minimize polychromatic aberrations. The shape of the objective lens, including radius of curvature and thickness of each lens element, is optimized to minimize monochromatic aberrations, which principally include spherical aberration and coma. The shape of the eyepiece lens, in conjunction with the shape of the objective lens, helps to further reduce monochromatic aberrations and increase the depth of field.