The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 28, 1995

Filed:

Nov. 09, 1993
Applicant:
Inventors:

Gyeong-Lyong Park, Daejeon, KR;

Sin-Chong Park, Daejeon, KR;

Hyung-Moo Park, Daejeon, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ; H01L / ;
U.S. Cl.
CPC ...
437228 ; 437225 ;
Abstract

A method is disclosed for manufacturing a very fast micro light valve of the type used to control the passage of light through a pixel. The method comprises preparing a substrate, which can be made of glass, and forming transparent electrodes on the main surface of the substrate. Next an insulating layer is deposited on the substrate and a first sacrificial layer is formed on the insulating layer. A pattern shifting element layer is formed on the first sacrificial layer and a second sacrificial layer is formed on the substrate and provided with a shifting element layer. After portions of the sacrificial layers are removed by etching to form a frame contact portion, a patterned frame layer is formed on the frame contact portion. Then a frame and a shifting element capable of moving in the frame under an applied external electrostatic force are formed by removing the remaining sacrificial layers.


Find Patent Forward Citations

Loading…