The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 1995
Filed:
Feb. 19, 1993
Applicant:
Inventors:
Chuen-Der Lien, Mountain View, CA (US);
Kyle W Terrill, Sunnyvale, CA (US);
Jeong Y Choi, Fremont, CA (US);
Assignee:
Integrated Device Technology, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437 28 ; 437 31 ; 437 34 ; 437 59 ; 257370 ;
Abstract
A first process embodiment of the present invention comprises the steps of implanting a blanket low dose n-well implant before field oxidation. A blanket n-type punchthrough suppression implant precedes the field oxidation step. After field oxidation, an implantation masking step is used to adjust the doping for the p-well in its active and field regions.
Lien, Chuen-Der. (1995). Method of optimizing wells for pmos and bipolar to yield an improved (U.S. Patent No. 5393677). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5393677
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile