The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 28, 1995

Filed:

Oct. 14, 1992
Applicant:
Inventors:

Yasuie Mikami, Tokyo, JP;

Masaaki Iosaki, Mitaka, JP;

Masao Shibasaki, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25C / ;
U.S. Cl.
CPC ...
204106 ; 204107 ; 204112 ; 204113 ; 204151 ;
Abstract

In order to ensure an easy operation, a decreased cost in maintenance and installation, and a safe and effective use of chlorine gas generated in a closed system, a new method for treating an etchant is offered. The method comprises the following steps of; 1 treating an etchant including copper (I) chloride or ferric chloride containing copper by means of an electrolysis using a diaphragm to withdraw copper electrolytically deposited in a cathode cell, 2 supplying chlorine gas generated in an anode cell into another etchant used in an etching process, thereby enabling the etchant to be regenerated.


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