The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 1995
Filed:
Jul. 13, 1992
Thomas G Roberts, Huntsville, AL (US);
Michael J Lavan, Huntsville, AL (US);
Brian R Strickland, Huntsville, AL (US);
The United States of America as represented by the Secretary of the Army, Washington, DC (US);
Abstract
A negative ion source is disclosed wherein an electron beam produced in one chamber is used to sustain a discharge in another chamber whose conditions are independently adjusted for optimum production of vibrationally excited hydrogen molecules. By including a provision for an independently controlled source of low energy electrons in a region near the extraction aperture, the optimum conditions for creation of H.sup.- ions by dissociative attachment are produced. In this manner the current and brightness of a H.sup.- beam may be maximized.