The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 1995

Filed:

Jun. 03, 1991
Applicant:
Inventor:

Sebastianus N Cuppen, Eindhoven, NL;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430 23 ; 430 26 ; 430 28 ; 430 29 ; 430291 ;
Abstract

At least partly overlapping patterns are formed on a substrate. The substrate is provided with a photosensitive layer which becomes tacky under the influence of light. The layer is exposed according to a pattern. A powder is provided on the exposed portions of the layer. The powder adheres to the exposed portions. Subsequently, the layer is again exposed according to a pattern which at least partly overlaps the first pattern. It has been found that a second powder adheres to the powder which has been provided first. In this manner, several powder layers can be provided on top or: each other on one photosensitive layer. This saves time.


Find Patent Forward Citations

Cuppen, Sebastianus. (1995). Method of forming a pattern on a subtrate, method of manufacturing a (U.S. Patent No. 5391444). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5391444

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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