The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 1995
Filed:
May. 13, 1993
Tohru Tanibata, Wakayama, JP;
Noritsu Koki Co., Ltd., Wakayama, JP;
Abstract
An improved exposure apparatus is capable of providing 100% of a light shielding affect when closing a PLZT optical shutter even if a light source remains turned on and thus produces a high-speed, high-quality exposures. For that purpose, the exposure apparatus includes a light source; a PLZT optical shutter of linear form extending at a right angle to a the pass line of a photosensitive material for exposing the photosensitive material during its running; a light modulation filter unit having a plurality of optical modulation filters arranged in a row along a light path of the light source; a light modulation filter driving mechanism for actuating the optical modulation filters separately to advance them to and retract them from a light path between the PLZT optical shutter and the light source, and a filter driving mechanism controller for controlling the movement of the light modulation filter driving mechanism so that a desired tone of light can be obtained at a predetermined timing.