The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 1995
Filed:
Jun. 24, 1993
Haruhisa Watanabe, Hachioji, JP;
Satoshi Tanaka, Hino, JP;
Shinya Matsuyama, Hachioji, JP;
Keita Sembu, Tokorozawa, JP;
Olympus Optical Co., Ltd., Tokyo, JP;
Abstract
Particle pattern judging method in which a particle pattern formed on the bottom surface of a reaction vessel by an immunological agglutinated reaction is measured in an optical manner; a variation ratio of light intensity of the border of the particle pattern is obtained and the particle pattern is judged whether it is agglutinated or not on the basis of the variation ratio: or a two-dimensional image of the particle pattern is picked up; the two-dimensional image of the particle pattern is differentiated to obtain differentiated values concerning pixel compositions consisting of the particle pattern; and the particle pattern is judged whether it is agglutinated or not on the basis of a distribution of the thus obtained differentiated values. By the method according to the invention, it is possible to judge whether the particle pattern is agglutinated or not in an exact manner, even when bubbles are included in the particle pattern, or the particle pattern is destroyed, or the particle pattern is torn or the agglutinating force of the particle pattern is weak.