The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 1995
Filed:
Mar. 21, 1994
Applicant:
Inventors:
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356401 ;
Abstract
Position of a pattern of a sample placed on a stage is detected by detecting position of a pattern edge. Distortion of the whole sample surface is detected by measuring height of the sample, slope of the surface of the sample at a detected pattern edge position is calculated, and the detected position of the pattern edge is corrected in accordance with the calculated slope.
Ototake, Taro. (1995). Pattern position measuring apparatus (U.S. Patent No. 5386294). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5386294
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