The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 1995

Filed:

Jun. 22, 1994
Applicant:
Inventor:

Thomas A Bartush, Wappingers Falls, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
437186 ; 437236 ; 437228 ; 156636 ;
Abstract

Polishing of a non-planar surface layer on a semiconductor substrate is conducted by providing an oxidized boron nitride polish stop layer on the semiconductor substrate, forming the non-planar surface layer on the oxidized boron nitride polish stop layer, the oxidized boron nitride polish stop layer being polish selective relative to the non-planar surface layer, and polishing the non-planar surface layer until the oxidized boron nitride polish stop layer is reached.


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