The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 1995
Filed:
Feb. 16, 1993
Michael Mallary, Berlin, MA (US);
Digital Equipment Corporation, Maynard, MA (US);
Abstract
One aspect of the present invention relates to enabling rotational flux conduction through magnetic film devices by creating a magnetic film layer with anisotropy perpendicular to the plane of the film layer, the film deposited in sufficient thickness so that there is a rest state rotational conduction path in the plane of the film layer. Another aspect of the invention is to provide for flux spreading in a magnetic device having perpendicular anisotropy. One feature of the present invention enables forming perpendicularly oriented central domains in a magnetic device so that the path for conduction of signal flux by rotation remains open even for very narrow signal flux paths. Another feature of the invention is to orient at rest domain states of a magnetic device pole (or poles) perpendicular to two desired in-plane rotational flux travel directions. Another feature of the invention is to orient edge domains in this type of magnetic device into a plane where their relative widths do not impact substantially on rotational flux flow through the device for narrow track heads. A preferred embodiment of the present invention includes at least one pole of a magnetic device, formed on a substrate, having a preferred at rest pole domain orientation perpendicular to the substrate plane.