The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 1995
Filed:
Mar. 01, 1994
Applicant:
Inventor:
Takeo Fujimura, Nagaokakyo, JP;
Assignee:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
313402 ; 313403 ;
Abstract
An apertured shadow mask is curved so that the curvature is concave on the back surface. The front surface generally follows the curvature of the back surface but has an undulating profile with ribs separated by troughs. The local thickness of the shadow mask is greatest in the ribs, and becomes gradually thinner toward the center lines of the troughs. The ribs and the center lines of the troughs have a zig-zag configuration. As a result, the front surface and neutral plane of the shadow mask have both convex and concave areas, which reduces localized doming.