The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 1995
Filed:
Nov. 22, 1991
Applicant:
Inventors:
James L Winkler, Palo Alto, CA (US);
Stephen P Fodor, Palo Alto, CA (US);
Christopher J Buchko, Palo Alto, CA (US);
Debra A Ross, Fremont, CA (US);
Lois Aldwin, San Mateo, CA (US);
Assignee:
Affymax Technologies N.V., Curacao, AN;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
436518 ; 436527 ; 436531 ; 436532 ; 436501 ; 436809 ; 436807 ; 435-71 ; 435968 ; 435969 ; 435970 ; 435973 ; 530334 ; 530335 ; 530337 ; 422134 ; 422149 ;
Abstract
A method and device for forming large arrays of polymers on a substrate (401). According to a preferred aspect of the invention, the substrate is contacted by a channel block (407) having channels (409) therein. Selected reagents are flowed through the channels, the substrate is rotated by a rotating stage (403), and the process is repeated to form arrays of polymers on the substrate. The method may be combined with light-directed methodolgies.
Published as: