The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 1995
Filed:
Mar. 14, 1994
Applicant:
Inventor:
Tsunesaburo Uemura, Tokyo, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S / ;
U.S. Cl.
CPC ...
372 58 ; 372 33 ; 372 29 ;
Abstract
An exposure apparatus, such as a stepper, uses a laser light source requiring new gas introduction from time to time. The timing of new gas addition and partial gas replacement is controlled so that the exposure apparatus is not adversely affected. In one embodiment, the timing is such that gas introduction or replacement occurs during interruption of exposure operation, which does not start again until the fluctuation of the output of laser light caused by gas introduction or replacement is stabilized.
Uemura, Tsunesaburo. (1995). Exposure apparatus with laser source requiring new gas introduction (U.S. Patent No. 5383217). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5383217
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile