The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 17, 1995

Filed:

Dec. 29, 1993
Applicant:
Inventors:

Stephen W Downey, Chatham, NJ (US);

Adrian B Emerson, Piscataway, NJ (US);

Anthony M Mujsce, Berkeley Heights, NJ (US);

Amy J Muller, Warren, NJ (US);

William D Reents, Jr, Middlesex, NJ (US);

James D Sinclair, Summit, NJ (US);

Alka Swanson, New Providence, NJ (US);

Assignee:

AT&T Corp., Murray Hill, NJ (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ; H01J / ;
U.S. Cl.
CPC ...
250288 ; 2504 / ;
Abstract

Disclosed is an apparatus which can serve to detect, count, size discriminate and analyze the chemical composition of particles in the air or process gases. In a preferred embodiment, the particles enter via a capillary into a differentially pumped chamber. A pulsed laser which is continuously fired is focused at an opening in the chamber. When the particles come into the path of the laser beam, the particles are fragmented and ionized. A dual time of flight mass spectrum is produced, recorded with an oscilloscope and analyzed with a computer. The mass spectrum information enables the determination of the chemical nature and concentration of the species of the particles, the particle size and the elemental composition of airborne particles in real time. Once these parameters are determined the source of the particles can be determined and eliminated from the environment and process. Thus, the inventive apparatus is advantageously used in conjunction with a facility, i.e., a semiconductor manufacturing facility, that requires ultra-clean conditions.


Find Patent Forward Citations

Loading…