The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 10, 1995

Filed:

Jan. 28, 1994
Applicant:
Inventors:

Paul L Provenzano, West Hartford, CT (US);

James L Swindal, East Hampton, CT (US);

Robert J Kuhlberg, Windsor, CT (US);

Charles B Brahm, Ellington, CT (US);

Harold D Meyer, South Windsor, CT (US);

Frank W Gobetz, South Windsor, CT (US);

Walter J Wiegand, Glastonbury, CT (US);

Robert H Bullis, Avon, CT (US);

Assignee:

United Technologies Corporation, Hartford, CT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01G / ;
U.S. Cl.
CPC ...
3612834 ; 73718 ; 73724 ; 29 2542 ;
Abstract

A silicon capacitive pressure sensor is disclosed having a silicon substrate and a silicon diaphragm separated by a glass dielectric spacer. The substrate has an upper surface formed as a mesa which is generally curved in shape, the curvature being concave. Due to manufacturing constraints the mesa upper surface comprises a series of concentric rings that approximate the desired concave shape. The step height and diameter of the rings are such that, at full deflection of the diaphragm, the diaphragm touches the center of the mesa, but not the edges of the individual steps. That is, letting the edges or corners of the steps define a curve, the radius of curvature of the diaphragm is smaller than the radius of curvature of the locus of the step corners.


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