The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 1995
Filed:
May. 05, 1993
Applicant:
Inventors:
Gerhard F Eggers, Isernhagen, DE;
Horst-Christian Langowski, Hanover, DE;
Assignees:
U.S. Philips Corp., New York, NY (US);
Du Pont Optical Co., New York, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20429803 ; 20419213 ;
Abstract
A cathode-sputtering apparatus for the surface-coating of objects has a vacuum chamber which contains a helium-group gas, in which chamber a target cathode and an anode are arranged. A voltage for producing plasma discharges is applied to these electrodes and a magnetic field is applied, which intensifies the plasma discharges and concentrates them at the location of the target cathode. For measuring a critical target-consumption condition, at least one probe is provided in the target cathode, which probe is actuated when the target material is eroded up to the probe.