The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 10, 1995

Filed:

Jul. 26, 1993
Applicant:
Inventors:

Scott A Chalmers, Albuquerque, NM (US);

Kevin P Killeen, Albuquerque, NM (US);

Kevin L Lear, Albuquerque, NM (US);

Assignee:

Sandia National Laboratories, Albuquerque, NM (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C30B / ;
U.S. Cl.
CPC ...
117 89 ; 437105 ; 437107 ; 437126 ; 437133 ;
Abstract

A method is described for reproducibly controlling layer thickness and varying layer composition in an MBE deposition process. In particular, the present invention includes epitaxially depositing a plurality of layers of material on a substrate with a plurality of growth cycles whereby the average of the instantaneous growth rates for each growth cycle and from one growth cycle to the next remains substantially constant as a function of time.


Find Patent Forward Citations

Chalmers, Scott. (1995). Method of deposition by molecular beam epitaxy (U.S. Patent No. 5379719). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5379719

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…