The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 1995

Filed:

Apr. 27, 1993
Applicant:
Inventors:

Mark J Devaney, Rochester, NY (US);

John S Lercher, Rochester, NY (US);

Lee F Frank, Rochester, NY (US);

Paul W Wagner, Holley, NY (US);

Jeffrey L Helfer, Webster, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03D / ;
U.S. Cl.
CPC ...
354331 ;
Abstract

A processor for processing a photosensitive material. The processor having a housing chamber. At least one modular wall structure is provided for dividing the housing chamber into a plurality of fluid processing chambers. A modular processing device is placed may be placed in at least one of the plurality of fluid processing chambers for circulating a processing fluid placed in said fluid processing chamber.


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