The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 1995

Filed:

Aug. 31, 1993
Applicant:
Inventors:

Nicolaas P Willard, Eindhoven, NL;

Ivo G Camps, Eindhoven, NL;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427305 ; 427558 ; 4274431 ; 427269 ;
Abstract

Oxidic surfaces can be chemically modified according to a pattern by providing one or several monolayers of a photosensitive silane. After patterned exposure of said photosensitive silane, the exposed pans are esterified with an alcohol which comprises at least one fluorine atom, so that said exposed areas become strongly hydrophobic. Subsequently, the unexposed areas are exposed, so that these areas become hydrophilic. The hydrophilic areas can then be metallized in an electroless process, thereby forming a metal pattern.


Find Patent Forward Citations

Willard, Nicolaas. (1995). Method of chemically modifying a surface in accordance with a pattern (U.S. Patent No. 5378502). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5378502

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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