The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 1995

Filed:

Jul. 16, 1992
Applicant:
Inventors:

Olivier Delobel, Paris, FR;

Jean Louise, Villejuif, FR;

Philippe Cornut, Echirolles, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
423210 ; 423230 ;
Abstract

The invention concerns a process for removing gaseous hydrides from a solid support of metallic oxides, which consists in causing a gas flow to circulate, at room temperature, on a solid support comprising at least copper and chromium and having a specific area lower than or equal to 100 m.sup.2 /g. This process may be used for the destruction of gaseous hydrides from the industry of semi-conductors, for example silanes, arsine, phosphine, diborane, germane, stannane, gallane, stibine, and hydrogen telluride, selenide and sulfide.


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