The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 1995
Filed:
Jun. 15, 1993
Applicant:
Inventors:
Walter Schmidt, Zurich, CH;
Marco Martinelli, Neftenbach, CH;
Assignee:
Dyconex Patente AG, Zug, CH;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; B29C / ; C23F / ;
U.S. Cl.
CPC ...
156644 ; 156656 ; 156902 ; 156668 ;
Abstract
A method for producing aligned passages through substrate materials, in which the projection of the inlet and outlet openings does not coincide, uses displaced application of etching windows on opposite sides and corresponding pronounced under-etching of these windows. By applying displaced etching windows on both sides of the substrate and through-etching the substrate through these windows, `oblique` passages are obtained through the substrate. By a suitable location of the windows it is also possible to produce branched passages with more than one outlet opening.