The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 1995
Filed:
Jun. 16, 1993
Mino Green, London, GB;
R R Syms, London, GB;
Andrew S Holmes, London, GB;
Ken Ueki, Tokyo, JP;
Hisaharu Yanagawa, Tokyo, JP;
The Furukawa Electric Co., Ltd., Tokyo, JP;
Abstract
This invention describes a method of manufacturing silica waveguide optical components in which silica glass films are laminated on a substrate by repeating a unit operation in which a sol material, a precursor of glass particles, is coated and then the coated layer is heated in an oxygen atmosphere. wherein the heating temperature is controlled in such a manner that the radius of curvature of warping of the substrate is 2 m or more after the coated layer is heated, thereby preventing cracking in the formed silica glass film and/or peeling of the coated layer. At locations where a difference in height is present, at least when sol is coated first time, the thickness of the coated layer is less than that of one of the subsequent coated layers.