The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 1995
Filed:
May. 10, 1993
Stuart D Asakawa, San Diego, CA (US);
Paul H McClelland, Monmouth, OR (US);
Ellen R Tappon, Corvallis, OR (US);
Richard R Vandepoll, Vancouver, WA (US);
Kenneth E Trueba, Corvallis, OR (US);
Chien-Hua Chen, Corvallis, OR (US);
Hewlett-Packard Company, Palo Alto, CA (US);
Abstract
A single mask is used to form a tapered nozzle in a polymer nozzle member using laser ablation. In one embodiment of the mask, clear portions of the mask, corresponding to the nozzle pattern to be formed, each incorporate a variable-density dot pattern, where the opaque dots act to partially shield the underlying polymer nozzle member from the laser energy. This partial shielding of the nozzle member under the dot pattern results in the nozzle member being ablated to less of a depth than where there is no shielding. By selecting the proper density of opaque dots around the peripheral portions of the mask openings, the central portion of each nozzle formed in the polymer nozzle member will be completely ablated through, and the peripheral portions of the nozzle will be only partially ablated through. By increasing the density of dots toward the periphery of each mask opening, the resulting nozzle may be formed to have any tapered shape. Other mask patterns are also described.