The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 1994

Filed:

Sep. 13, 1991
Applicant:
Inventors:

Markus I Flik, Boston, MA (US);

Alfredo Anderson, Watertown, MA (US);

Byungin Choi, Cambridge, MA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J / ;
U.S. Cl.
CPC ...
364557 ; 364563 ; 374120 ; 374121 ; 427 10 ; 505829 ; 505842 ;
Abstract

Apparatus and method for non-contact temperature measurement of a film growing on a substrate which accounts for the change in emissivity due to the change in film thickness. The system employs an adaptively calibrated pyrometer wherein the substrate emittance is continuously computed so that the temperature measurement is accurate regardless of the emittance variation. The new system is easily constructed by adding data processing system software and hardware to conventional pyrometers.


Find Patent Forward Citations

Flik, Markus. (1994). Non-contact temperature measurement of a film growing on a substrate (U.S. Patent No. 5377126). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5377126

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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