The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 1994
Filed:
Dec. 10, 1992
Applicant:
Inventors:
James J Appel, Brighton, NY (US);
John A Durbin, Webster, NY (US);
John R Andrews, Fairport, NY (US);
Assignee:
Xerox Corporation, Stamford, CT (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B / ;
U.S. Cl.
CPC ...
359216 ; 359 65 ; 359494 ;
Abstract
In an overfilled ROS polygon architecture, stray reflection from facets adjacent the completely filled (illuminated) facet are neutralized by placing an optical isolator in the path of the unwanted stray reflections. In a first embodiment, the isolator comprises a linear polarizer and a quarter wave plate. In a second embodiment, the isolator comprises a liquid crystal quarter wave plate and a cholesteric liquid crystal cell.