The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 1994

Filed:

Sep. 03, 1993
Applicant:
Inventors:

Tsai-Wie Tseng, Hsinchu, TW;

Tze-Chiang Chiao, Hsinchu, TW;

Chin-Chih Chou, Miao-li Hsuan, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08J / ;
U.S. Cl.
CPC ...
521 27 ; 524127 ; 524145 ; 524284 ; 524297 ; 424 7808 ; 424 781 ;
Abstract

A new process for preparing a separation membrane from aminated polysulfone resin or blends of aminated polysulfone-blended materials which utilizes an organic additive having a low or negligible water-solubility (instead of conventional water-soluble organics, polymers, or inorganic salts) in the casting solution. The resulting membrane exhibits high water-permeability and is capable of being formed at a high production rate when using a wet casting machine.


Find Patent Forward Citations

Tseng, Tsai-Wie. (1994). Aminated polysulfone membrane and process for its preparation (U.S. Patent No. 5376689). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5376689

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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