The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 1994
Filed:
Jan. 08, 1993
Wolfgang Ehrfeld, Mainz, DE;
Herbert O Moser, Karlsruhe, DE;
Klaus Mullen, Mainz, DE;
Christoph Bubeck, Eltville, DE;
Hans-Dieter Bauer, Partenheim, DE;
IMM, Institut fur Mikrotechnik GmbH, Mainz, DE;
Abstract
A method to produce nonlinear optical microcomponents is described which employs hitherto not yet used material combinations. Not only waveguide structures are produced by means of X-ray depth lithography, but also microcell structures, into which materials having nonlinear optical properties are introduced. The microstructure is produced as a positive mold part, from which there is subsequently generated, by means of electroforming, a mold insert, a negative of which is made using a polymer material. After the molding operation the microstructure is applied to a substrate, and nonlinear optical material, covered by a cover plate if needed or desired, is introduced into the microcell structure.