The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 1994
Filed:
Jan. 07, 1993
Wolfgang Ehrfeld, Mainz, DE;
Herbert O Moser, Karlsruhe, DE;
Klaus Mullen, Mainz, DE;
Christoph Bubeck, Eltville, DE;
Hans-Dieter Bauer, Partenheim, DE;
IMM, Institut fur Mikrotechnik GmbH, Mainz, DE;
Abstract
A method to produce nonlinear optical microcomponents is described which makes it possible to employ material combinations not yet used to date. By means of X-ray depth lithography not only waveguide structures, but also microcell structures are produced, into which subsequently material of nonlinear optical properties is placed. By means of X-ray depth lithography and micromolding techniques a mold insert with a waveguide structure is produced as a positive mold, and the waveguide structure is impressed into a polymer base material by means of the mold insert. Then the impressed waveguide structure is filled with optically linear material, and after the filling operation at least one microcell structure is produced, at least in the areas of the optically linear material, into which microcell structure optically nonlinear material is placed. The microcell structure may also be impressed by means of another mold insert.