The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 1994
Filed:
Feb. 27, 1992
Applicant:
Inventor:
Charles B Zarowin, Rowayton, CT (US);
Assignee:
Hughes Aircraft Company, Los Angeles, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; B44C / ;
U.S. Cl.
CPC ...
156643 ; 156639 ; 156657 ; 156662 ; 156345 ;
Abstract
A plasma is used in conjunction with a plasma assisted chemical etching material removal tool 10 to rapidly and precisely polish and smooth a substrate without mechanically contacting the surface. The pressure of a process gas, which disassociates into reactive plasma species in the presence of an applied radio frequency field, is controlled so as to allow the selection of a primarily unidirectional or a primarily omnidirectional polishing and smoothing mechanism.