The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 1994

Filed:

Aug. 09, 1993
Applicant:
Inventors:

Andrew S Zarchy, Amawalk, NY (US);

Chien C Chao, Millwood, NY (US);

Richard T Maurer, Nanuet, NY (US);

Assignee:

UOP, Des Plaines, IL (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
95 41 ; 95 96 ; 95132 ; 95902 ;
Abstract

A process is provided for the removal and recovery of chlorine from a chlorine plant offgas stream. A pressure swing adsorption (PSA) process is used to remove from the chlorine plant offgas a vent gas stream comprising hydrogen and a tail gas stream comprising chlorine which is subsequently liquefied. The PSA zone comprises at least 2 adsorption beds, wherein each of the adsorption beds comprises a first adsorption layer and at least a second adsorption layer. The first adsorption layer contains a weak adsorbent selective for the adsorption of chlorine and has a large pore structure with 12 member rings or more. The second adsorption layer contains a strong adsorbent selective for the adsorption of chlorine and has a small pore structure with 10 member rings, or less. The vent gas withdrawn from the process is essentially free of chlorine.


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