The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 1994
Filed:
Feb. 26, 1993
Allen J Bartlett, Milford, MA (US);
Stephen J Yamartino, Wayland, MA (US);
Helix Technology Corporation, Mansfield, MA (US);
Abstract
In a fast partial regeneration process, the second stage of a cryopump is heated as purge gas is applied to the cryopump. In a test loop, the purge gas is turned off and the roughing valve is opened. If the cryopump is judged to be sufficiently empty of gases from the second stage by being roughed to a sufficiently low pressure in a short period of time the system proceeds to a reconditioning phase. If the system fails the test, however, it is repurged with a burst of warm purge gas and then retested. After passing the emptiness test, the pressure is further reduced by the roughing pump as heat is applied to the second stage. The heat is then turned off for cool down as the system continues to be rough pumped to a base pressure. At about the base pressure, the roughing valve is cycled to maintain the cryopump pressure at a level near to the base pressure. Where multiple cryopumps are coupled to a common roughing pump manifold, they are processed through a partial regeneration sequence in lock step to avoid cross contamination.