The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 1994
Filed:
May. 21, 1993
Akira Yabe, Ibaraki, JP;
Hiroyuki Niino, Ibaraki, JP;
Nobuhiro Kondo, Tokyo, JP;
Hirokazu Ono, Tokyo, JP;
Tomoaki Takahashi, Tokyo, JP;
Yoshinaga Takahashi, Tokyo, JP;
Toshio Matsumura, Tokyo, JP;
Director-General of Agency of Industrial Science and Technology, Tokyo, JP;
Seikosha Co., Ltd., Tokyo, JP;
Abstract
A method of processing a photosensitive glass includes exposing. Photosensitive glass by radiation from a laser whose oscillation wavelength lies within the range of wavelengths of exposing light to which the glass responds. Then, the exposed portions 1c are thermally developed and etched. Since a laser beam propagates with a high rectilinearity, the front and rear surfaces of thick photosensitive glass can be exposed without producing dimensional errors. Therefore, the etching accuracy is improved. Especially, where the front and rear surfaces of photosensitive glass are etched, both surfaces can be processed so as to form the same shape in them accurately. In addition, because almost all the energy of the laser radiation is used for exposure of the photosensitive glass, the energy is not wasted and so the efficiency is high.