The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 1994
Filed:
May. 12, 1992
Juan F Lam, Agoura Hills, CA (US);
Huan-Wun Yen, Westlake Village, CA (US);
Joseph L Pikulski, Westlake, CA (US);
Hughes Aircraft Company, Los Angeles, CA (US);
Abstract
A diffraction limited working beam at a given frequency is amplified without degrading its diffraction limited quality by diverting a minor portion of the beam as a probe beam, and amplifying the remaining portion of the working beam with a high power pump beam at a different wavelength. The amplification takes place in a host medium that has a rare earth dopant with an energy transition from the pump beam's wavelength to the wavelength of the working beam. The resulting amplified working beam is non-diffraction limited. The probe beam is frequency modulated and coupled with the amplified working beam in a second host medium that also has a rare earth dopant. Energy is transferred from the amplified working beam to the modulated probe beam through a resonant energy transfer in the second host medium, producing an amplified output beam at the working beam frequency that retains the diffraction limited quality of the probe beam.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile