The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 1994
Filed:
Jul. 06, 1993
Applicant:
Inventors:
Francis P Fehlner, Corning, NY (US);
Paul A Sachenik, Corning, NY (US);
Assignee:
Corning Incorporated, Corning, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
427578 ; 4272481 ; 4273977 ; 427402 ;
Abstract
A method for producing a glass panel for silicon device fabrication, which method comprises forming a noncrystalline, or mixed-phase, silicon film on a glass substrate, the glass having a strain point greater than 560.degree. C., and subjecting the filmed glass to a heat treatment comprising heating at a temperature of at least 550.degree. C. for a period of time sufficient to convert the silicon film to polycrystalline silicon and to compact the glass.