The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 1994
Filed:
Jun. 24, 1993
Applicant:
Inventors:
Franco Cerrina, Madison, WI (US);
Jaibei Xiao, Madison, WI (US);
Assignee:
Wisconsin Alumni Research Foundation, Madison, WI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
378 34 ; 378 84 ; 378145 ;
Abstract
An X-ray lithography beamline imaging system has a single condenser mirror with an aspherical reflecting surface, with symmetry only about a plane, without axial symmetry. For an X-ray beam emitted along a y axis and diverging along x and z axes, the reflecting surface is asymmetrical about the y axis and has different focusing power in directions along the x and z axes in an imaging plane orthogonal to the y axis and spaced from the mirror along the y axis such that the mirror reflects and focuses the X-ray beam to a point along the y axis in the imaging plane and to a line along the x axis in the imaging plane.