The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 1994
Filed:
Oct. 09, 1992
Chiu Chau, Woodbridge, NJ (US);
Instruments SA, Inc., Edison, NJ (US);
Abstract
A light analysis system is disclosed and comprises a source of substantially collimated light to be analyzed. The source comprises a sample excited by a collimated laser light source, and further comprises a holographic notch filter having the characteristic of reflecting light at the excitation wavelenghth at which the source is excited. An aberration corrected concave focusing diffraction grating receives the collimated light and focuses it at a point corresponding to its wavelength. A detector detects light at a desired wavelength focused by the diffraction grating. The holographic notch filter is positioned to filter the source of substantially collimated light to be filtered and the holographic notch filter is oriented substantially at an angle with respect to the collimated laser light source to result in a path length for the collimated laser light source which constrains a path length through the notch filter which causes the collimated laser light to be reflected by the filter away from the grating. The grating is an aberration corrected concave focusing diffraction grating. The collimated light is in the form of a bundle having a width on the order of ten millimeters.