The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 1994
Filed:
Oct. 21, 1993
Raymond K Tsui, Phoenix, AZ (US);
Motorola, Inc., Schaumburg, IL (US);
Abstract
The present invention is a method of forming a quantum multi-function semiconductor device. In the method of the present invention, an insulating layer (12) is formed on a semiconductor substrate (11). An opening (14) is formed in the insulating layer (12), and a channel region (15) is formed in the opening (14). A channel layer (21) is formed over the channel region (15). An opening (23) is formed through the channel layer (21) such that a portion of the opening is over a portion of the channel region (15). A source electrode (28) is formed to contact a channel layer (17) of the channel region (15), a drain electrode (29) is formed to contact the channel layer (21), and a gate electrode (31) is formed to contact the second barrier layer (27).