The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 1994
Filed:
Oct. 12, 1993
John W Powers, Springfield, MO (US);
Daniel G Choate, Everton, MO (US);
Western Litho Plate & Supply Co., St. Louis, MO (US);
Abstract
Automated apparatus and method for exposing lithographic plates to light through films and masks. The method involves placing a plate, film and mask at an exposure station in superposed relation to one another with the film overlying the plate and the mask overlying the film, exposing the plate to light through the mask and film at the exposure station, raising the mask off the film to a raised position, gripping the film and moving it relative to the plate to expose a portion of the plate therebelow, gripping the exposed portion of the plate, gripping the mask in its raised position, moving the film, plate and mask forwardly while so gripped to a discharge station, and releasing the film, plate and mask at the discharge station.