The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 29, 1994

Filed:

Mar. 02, 1993
Applicant:
Inventors:

Yutaka Ozawa, Tokyo, JP;

Hisanori Ohta, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L / ; C08F / ;
U.S. Cl.
CPC ...
524560 ; 524562 ; 524841 ; 526227 ; 5263186 ;
Abstract

A copolymer latex is provided which comprises 30 to 90% by weight of a conjugated diene monomer unit, 9 to 50% by weight of an ethylenically unsaturated nitrile monomer unit, 0.1 to 20% by weight of an ethylenically unsaturated acid monomer unit and 0 to 20% by weight of an other ethylenically unsaturated monomer unit copolymerizable therewith, having a polystyrene-converted weight average molecular weight of 50,000 to 500,000, and containing 45% or less of methyl ethyl ketone insoluble matter. The latex is presented by emulsion polymerization using a polymerization initiator containing a peroxide whose decomposition temperature giving a half-life period of 10 hours is 100.degree. C. or higher and a reducing agent. The latex is used advantageously for dip molding.


Find Patent Forward Citations

Ozawa, Yutaka. (1994). Copolymer latex, method for preparing the same and use thereof (U.S. Patent No. 5369166). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5369166

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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