The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 29, 1994

Filed:

Jun. 28, 1993
Applicant:
Inventors:

Noriaki Itom, Nagoya, JP;

Yasuo Nakai, Kani, JP;

Ken Hattori, Tokyo, JP;

Junichi Kanasaki, Aichi, JP;

Akiko Okano, Toyota, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
117108 ; 437105 ; 437107 ; 437133 ; 437173 ;
Abstract

A basic sample having a surface is set in an ultrahigh vacuum chamber. Atoms constituting the sample are deposited on the surface of the sample to remove vacancy-type defects. A laser beam having a predetermined wavelength and a predetermined fluence is radiated on the sample to remove adatom-type and kink-type defects, thereby producing a defect-free surface. In addition, the same material as that for a basic sample is deposited on a defect-free surface to produce a defect-free thin film.


Find Patent Forward Citations

Itom, Noriaki. (1994). Method of producing defect-free perfect surfaces (U.S. Patent No. 5367980). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5367980

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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