The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 1994
Filed:
Apr. 18, 1994
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
An abstract pattern plate making system comprising a grain pattern generator for generating grain patterns free of unintended repetitive patterns. When an image size, a grain count, maximum displacement amounts and a grain shape are input, the grain pattern generator generates the basic addresses of the designated number of grains in such a manner that the grains occur at equal and uniform intervals in the designated image size and that the number of grains per unit area remains constant. The address of each grain is then displaced relative to its basic address with the designated maximum amounts of displacement. The designated grain shape is assigned to each of the displaced addresses so as to generate a grain pattern. If the address of any grain protrudes out of the designated image size, the grain pattern generator transfers the protruding pixel to a location opposite to the protruding side so as to keep the grain within the designated size.