The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 1994

Filed:

Jan. 03, 1994
Applicant:
Inventor:

Shigeru Hayata, Kodaira, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B / ; G02B / ; G03B / ; C03F / ;
U.S. Cl.
CPC ...
359558 ; 359738 ; 359894 ; 355 53 ; 355 71 ;
Abstract

An image projection apparatus and method is disclosed wherein a stop having a rectangular opening is disposed in an illumination optical system and, through the function of this stop, a rectangular effective light source is defined on a pupil of a projection optical system. With light from this effective light source, longitudinal and transverse patterns of a reticle extending substantially along the configuration of the effective light source are illuminated. Zeroth order and first order diffraction light caused by these patterns is incident and distributed on the pupil so as to define thereon a rectangular configuration about the center of the pupil, and the longitudinal and transverse patterns are imaged with the diffraction light.


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Hayata, Shigeru. (1994). Image projection method and semiconductor device manufacturing method (U.S. Patent No. 5367404). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5367404

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