The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 1994

Filed:

Mar. 01, 1993
Applicant:
Inventors:

Masazumi Ishikawa, Uji, JP;

Hiroaki Misawa, Takatsuki, JP;

Noboru Kitamura, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J / ;
U.S. Cl.
CPC ...
250251 ; 522-2 ;
Abstract

A method for forming a polymer particle is provided which involved irradiating a polymer solution with a laser beam. The polymer particle is formed at the focal area of the beam. The particle is reversible and disappears upon discontinuing the irradiation. Irreversible particles can be formed by including a reactive monomer in the solution. The particles are trapped by the beam and may be moved for processing and modification by moving the laser beam.


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