The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 1994

Filed:

May. 28, 1993
Applicant:
Inventors:

Porponth Sichanugrist, Kanagawa, JP;

Tetsuro Nii, Tokyo, JP;

Takahisa Kase, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B / ;
U.S. Cl.
CPC ...
423346 ; 423345 ; 437100 ;
Abstract

A method of forming p-type silicon carbide which comprises using reactive source gases comprising silane, hydrogen, trimethylboron, and either diborane or boron trifluoride, to thereby attain a widened band gap by the action of the carbon contained in the trimethylboron.


Find Patent Forward Citations

Sichanugrist, Porponth. (1994). Method of forming p-type silicon carbide (U.S. Patent No. 5366713). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5366713

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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