The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 1994
Filed:
Dec. 23, 1992
Applicant:
Inventors:
Brij B Lal, San Jose, CA (US);
Tadashi Shinohara, Fremont, CA (US);
Assignee:
HMT Technology Corporation, Fremont, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20429819 ; 20429817 ; 20429821 ; 20429813 ;
Abstract
A target assembly for use in a magnetron sputtering apparatus having a source of a magnetic field. The apparatus includes an annular sputtering target, and inner and outer poles surrounding the target, defining inner and outer confronting walls which extend beyond the target surface, for conducting magnetic flux across the target. These confronting walls are lined with inner and outer confronting target rings. The annual target and target rings may have different compositions, for use in forming sputtered films with a gradient composition.