The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 1994
Filed:
Oct. 04, 1993
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
An improvement is proposed in the method for the flame hydrolysis of a silicon-containing gas, e.g., silicon tetrachloride, to produce fine silica particles to be deposited on a substrate in a process for the preparation of a silica glass preform of optical fibers by using a fivefold concentric multiplex-tube burner nozzle. In contrast to the conventional way for the flame hydrolysis in which the center or first nozzle opening of the burner serves for ejection of a mixture of silicon tetrachloride and oxygen and hydrogen is ejected from the third nozzle opening while argon is ejected from the second nozzle opening inbetween, the gas ejected from the second nozzle opening is, instead of argon alone, a mixture of oxygen and argon in a specified mixing proportion so that deposition of silica particles on the nozzle end can be prevented even when the feed rate of silicon tetrachloride is relatively high.