The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 15, 1994

Filed:

Dec. 31, 1992
Applicant:
Inventor:

James F O'Neill, Penfield, NY (US);

Assignee:

Xerox Corporation, Stamford, CT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; G01D / ;
U.S. Cl.
CPC ...
430320 ; 430330 ; 430324 ; 430315 ; 430328 ; 340 / ; 298901 ; 347 63 ;
Abstract

In bubble jet heater dies, a photolithographic process is disclosed to form patterned photoresist structures having re-entrant angles to facilitate an improved lift-off structure for anti-cavitation layer deposition. A substrate is coated with a photoresist which includes 0.5% to 1.0% Monazoline C. When exposed to Ultra-Violet light and developed, apertures in the photoresist have inverted side walls. Anti-cavitation material, such as tantalum, is then sputtered onto the substrate and the photoresist to form patterned metal. structures. The lift-off of the patterned photoresist is easily performed leaving behind the patterned metal structures. The use of this lift-off deposition method prevents stress-cracking in the anti-cavitation layer seen in deposition and etch methods.


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