logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 5364665 B1

PDFFull Text
Date of Patent:
Nov. 15, 1994

Filed:

Oct. 25, 1993

Method for rapid plasma treatments

Applicant:
Inventors:

John T Felts, Alameda, CA (US);

Hood Chatham, III, Fairfield, CA (US);

Joseph Countrywood, Napa, CA (US);

Robert J Nelson, Walnut Creek, CA (US);

Assignee:

The BOC Group, Inc., Murray Hill, NJ (US);

Attorneys:

Draegert; David A.

Cassett; Larry R.

Primary Examiner:

Bernard Pianalto

Int. Cl.
CPC ...
B05D / ; B05D / ;
U.S. Cl.
CPC ...
427571 ; 4272553 ; 427296 ; 4273981 ; 427574 ; 427579 ; 427598 ;
Abstract

A plasma treating apparatus is useful for coating substrates with thin films having vapor barrier properties at relatively rapid deposition rates. The apparatus comprises an evacuable chamber, an electrically powered electrode defining a plasma-facing surface within the chamber, and a shield spaced a distance .DELTA. transverse to the plasma-facing surface. During plasma treatments, the plasma is confined to within distance .DELTA. while a substrate is continuously fed through the confined plasma.

Find Patent Forward Citations

Felts, John. (1994). Method for rapid plasma treatments (U.S. Patent No. 5364665). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5364665

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…