The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 15, 1994

Filed:

May. 06, 1993
Applicant:
Inventors:

Louis K Bigelow, Harvard, MA (US);

Frank J Csillag, Salt Lake City, UT (US);

James T Hoggins, Plano, TX (US);

Assignee:

Norton Company, Worcester, MA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B24D / ;
U.S. Cl.
CPC ...
51293 ; 51298 ; 51307 ; 51295 ; 427249 ; 427122 ; 427577 ; 427132 ; 4272555 ; 423446 ;
Abstract

Synthetic diamond film produced by chemical vapor deposition can be crushed to obtain diamond grit which has useful abrasive properties. The flexibility of CVD deposition processes in determining diamond film properties means that CVD diamond grit properties can be tailored to particular abrasive applications. In a disclosed embodiment, the grit particles are coated with a magnetic material. The coated grit particles can then be aligned with a magnetic field, and the coated grit particles are bonded to a matrix while aligned. In a further disclosed form of the invention, a chemical vapor deposition system, such as an arc jet plasma deposition system, is provided in a chamber.


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